Systems and methods for forming zirconium .
... a zirconium and/or hafniumcontaining layer ... using a vapor deposition ... and R″ are each independently an organic group and M is zirconium or hafnium. ...
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... a zirconium and/or hafniumcontaining layer ... using a vapor deposition ... and R″ are each independently an organic group and M is zirconium or hafnium. ...
... layers provide an insulating layer in a variety of ... to deposit hafnium by atomic layer deposition. ... zirconium oxide atomic layer deposited ...
... a zirconium and/or hafniumcontaining layer on ... nitrogendoped polysilicon), a metallic layer 60, insulating ... Atomic layer deposition of zirconiumdoped ...
A dielectric film containing a nanolaminate with a hafnium oxide layer and a zirconium oxide layer and a method of fabricating such a dielectric film produce a ...
... on the hafnium metal layer by atomic layer deposition form a hafnium oxide dielectric ... Atomic layer deposited ... Atomic layer deposited zirconium ...
... titanium and zirconium by atomic layer deposition includes ... in insulating layer: ... Deposition of hafnium oxide and/or zirconium oxide and ...
... a zirconium and/or hafniumcontaining layer on a ... "Atomic layer deposition" ... Lanthanide oxide/zirconium oxide atomic layer deposited nanolaminate ...
... selfsaturating atomic layer deposition ... Plasma pretreating surfaces for atomic layer deposition ... ZrO 2, hafnium and zirconium silicates, ...
... wherein forming a layer of zirconium oxide includes forming a layer of zirconium oxide by atomic layer deposition. ... Genus, Inc: Radical ... a hafniumbased ...
... "ALD Metal Oxide Deposition Process Using Direct ... ALD metal oxide deposition process using direct oxidation: ... atomic layer deposition of hafnium ...
To form hafnium nitride by atomic layer deposition, a hafniumcontaining precursor ... 1305N include an insulating nitride layer. ... Zirconium and/or hafnium ...
... a zirconium and/or hafniumcontaining layer on ... the formation of the insulating layer formation by a deposition process ... "Atomic layer deposition ...
The zirconium silicon oxide film may be formed by atomic layer deposition. The zirconium ... insulating layer having an atomic ... Atomic layer deposited hafnium ...
The metal compounds have surprisingly and significantly improved uniformity when deposited by atomic layer deposition ... Zirconium and/or hafnium ... insulating ...
... a zirconium silicon oxide film is formed by atomic layer deposition using a zirconium precursor ... including an insulating layer having a zirconium ... hafnium ...
A gate dielectric is formed by atomic layer deposition employing a hafnium ... "Atomic Layer Deposition of Zirconium ... 3 Insulating Layer for ...
The hafnium tantalum oxynitride film may be formed using atomic layer deposition. ... metals include hafnium, yttrium, zirconium, ... an insulating nitride layer.
The dielectric structure is formed by depositing hafnium by atomic layer deposition onto ... a insulating layer is ... "Atomic Layer Deposition of Zirconium ...
Atomic layer deposited dielectric layers containing a lanthanum hafnium oxide layer and methods of fabricating such dielectric layers provide an insulating layer in a ...
... including an insulating layer having a hafnium titanium ... Atomic layer deposition ... Lanthanide oxide/zirconium oxide atomic layer deposited nanolaminate ...
The use of atomic layer deposition (ALD) to form a dielectric layer of hafnium oxide (HfO 2) doped with dysprosium (Dy) and a method of fabricating such a combination ...
1. Introduction. Atomic layer deposition (ALD) has recently penetrated research and development lines of several major memory and logic manufacturers due to the ...
In some embodiments aluminum fluoride thin films are deposited by ... comprises hafnium or zirconium. ... for atomic layer deposition of hafnium ...
Atomic layer deposited HfSiON dielectric films wherein each ... Atomic layer deposited zirconium ... oxide and hafnium oxide using atomic layer deposition:
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